Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining
| Autor: | Vital, A., Vayer, M., Sinturel, C., Tillocher, T., Lefaucheux, P., Dussart, R., Boufnichel, M. |
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| Zdroj: | In Polymer 12 October 2015 76:123-130 |
| Databáze: | ScienceDirect |
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