Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography
| Autor: | Lee, Jai-Hyong, Ahn, Kwang-Duk *, Cho, Iwhan |
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| Zdroj: | In Polymer February 2001 42(4):1757-1761 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Lee, Jai-Hyong, Ahn, Kwang-Duk *, Cho, Iwhan |
|---|---|
| Zdroj: | In Polymer February 2001 42(4):1757-1761 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
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