Fabrication of 53.2 nm pitch self-traceable gratings by laser-focused atomic deposition combined with extreme ultraviolet interference lithography

Autor: Tang, Zhaohui, Zhao, Jun, Deng, Xiao, Tan, Wen, Wu, Yanqing, Tai, Renzhong, Cheng, Xinbin, Li, Tongbao
Zdroj: In Optik May 2023 279
Databáze: ScienceDirect