High-accuracy spectral interferometer with multi-Fabry–Perot Etalon for thickness measurement of the silicon wafer

Autor: Chen, Meiyun, Pang, Shuiling, Zhou, Jinglun, Wu, Heng, Hirokazu, Matsumoto, Kiyoshi, Takamasu
Zdroj: In Optics Communications 15 December 2021 501
Databáze: ScienceDirect