PQ/PMMA photopolymer: Modelling post-exposure

Autor: Qi, Yue, Li, Haoyu, Tolstik, Elen, Guo, Jinxin, Gleeson, Michael R., Sheridan, John T.
Zdroj: In Optics Communications 1 March 2015 338:406-415
Databáze: ScienceDirect