Near-field double-spot photolithography with subwavelength spacing
| Autor: | Zhang, Yaoju, Suyama, Taikei, Shi, Tianzhen |
|---|---|
| Zdroj: | In Optics Communications 2010 283(15):3022-3025 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Zhang, Yaoju, Suyama, Taikei, Shi, Tianzhen |
|---|---|
| Zdroj: | In Optics Communications 2010 283(15):3022-3025 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect