High performance DMD lithography based on oblique Scanning, pulse Lighting, and optical distortion calibration
| Autor: | Lee, Wen-Feng a, Wu, Chun-Ying b, Lee, Yung-Chun a, ⁎ |
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| Zdroj: | In Optics and Laser Technology May 2025 183 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect