Plasma damage in thin gate MOS dielectrics and its effect on device characteristics and reliability
| Autor: | Brożek, Tomasz *, Huber, John, Walls, James |
|---|---|
| Zdroj: | In Microelectronics Reliability 1 April 2000 40(4-5):625-631 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect