Effect of electroless Cu depositions for micro-via structure and thermal cycling reliability

Autor: Zhang, Zheng, Hsieh, Ming-Chun, Liu, Ran, Yeom, Jeyun, Suetake, Aiji, Yoshida, Hiroshi, Chen, Chuantong, Kang, Joonhaeng, Honma, Hidekazu, Kitahara, Yuhei, Matsunami, Takashi, Otsuka, Kuniaki, Suganuma, Katsuaki
Zdroj: In Microelectronics Reliability November 2022 138
Databáze: ScienceDirect