Comparison of reliability of 100 nm AlGaN/GaN HEMTs with T-gate and SAG-gate technology

Autor: Dammann, M., Baeumler, M., Brückner, P., Kemmer, T., Konstanzer, H., Graff, A., Simon-Najasek, M., Quay, R.
Zdroj: In Microelectronics Reliability September 2018 88-90:385-388
Databáze: ScienceDirect