Static fault localization of subtle metallization defects using near infrared photon emission microscopy

Autor: Quah, A.C.T., Nagalingam, D., Moon, S., Susanto, E., Ang, G.B., Neo, S.P., Lam, J.C., Mai, Z.H.
Zdroj: In Microelectronics Reliability June 2017 73:76-91
Databáze: ScienceDirect