Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability
| Autor: | Mutch, Michael J., Pomorski, Thomas, Bittel, Brad C., Cochrane, Corey J., Lenahan, Patrick M., Liu, Xin, Nemanich, Robert J., Brockman, Justin, French, Marc, Kuhn, Markus, French, Benjamin, King, Sean W. |
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| Zdroj: | In Microelectronics Reliability August 2016 63:201-213 |
| Databáze: | ScienceDirect |
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