Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment

Autor: Wang, X.Y., Zhang, H., Ma, X.P., Cheng, Q., Li, C.G., Li, M.X., Chen, T.N., Zhang, P., Shao, J.Q.
Zdroj: In Microelectronics Reliability February 2016 57:79-85
Databáze: ScienceDirect