Defects evolution involving interface dispersion approaches in high-k/metal-gate deep-submicron CMOS
Autor: | Abdul Wahab, Y., Soin, N., Hatta, S.W.M. |
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Zdroj: | In Microelectronics Reliability September-October 2014 54(9-10):2334-2338 |
Databáze: | ScienceDirect |
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