A simple method for sub-100 nm pattern generation with I-line double-patterning technique

Autor: Tsai, Tzu-I, Lin, Horng-Chih, Jian, Min-Feng, Huang, Tiao-Yuan, Chao, Tien-Sheng
Zdroj: In Microelectronics Reliability 2010 50(5):584-588
Databáze: ScienceDirect