A simple method for sub-100 nm pattern generation with I-line double-patterning technique
Autor: | Tsai, Tzu-I, Lin, Horng-Chih, Jian, Min-Feng, Huang, Tiao-Yuan, Chao, Tien-Sheng |
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Zdroj: | In Microelectronics Reliability 2010 50(5):584-588 |
Databáze: | ScienceDirect |
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