Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology
| Autor: | Alvarez, David, Chatty, Kiran, Russ, Christian, Abou-Khalil, Michel J., Li, Junjun, Gauthier, Robert, Esmark, Kai, Halbach, Ralph, Seguin, Christopher |
|---|---|
| Zdroj: | In Microelectronics Reliability 2009 49(12):1417-1423 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect