Dielectric thinning model applied to metal insulator metal capacitors with Al 2O 3 dielectric

Autor: Allers, K.H., Böck, J., Boguth, S., Goller, K., Knapp, H., Lachner, R.
Zdroj: In Microelectronics Reliability 2009 49(12):1520-1528
Databáze: ScienceDirect