Wear out failure mechanisms in aluminium and gold based LDMOS RF power applications

Autor: van der Wel, P.J., Theeuwen, S.J.C.H., Bielen, J.A., Li, Y., van den Heuvel, R.A., Gommans, J.G., van Rijs, F., Bron, P., Peuscher, H.J.F.
Zdroj: In Microelectronics Reliability 2006 46(8):1279-1284
Databáze: ScienceDirect