Characterisation of the Al 2O 3 films deposited by ultrasonic spray pyrolysis and atomic layer deposition methods for passivation of 4H–SiC devices

Autor: Wolborski, Maciej, Bakowski, Mietek, Ortiz, Armando, Pore, Viljami, Schöner, Adolf, Ritala, Mikko, Leskelä, Markku, Hallén, Anders
Zdroj: In Microelectronics Reliability 2006 46(5):743-755
Databáze: ScienceDirect