Characterization of various insulators for possible use as low- k dielectrics deposited at temperatures below 200 °C
| Autor: | Vasilopoulou, M., Douvas, A.M., Kouvatsos, D., Argitis, P., Davazoglou, D. |
|---|---|
| Zdroj: | In Microelectronics Reliability 2005 45(5):990-993 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect