Does short wavelength lithography process degrade the integrity of thin gate oxide?
| Autor: | Kim, S.J., Cho, B.J., Chong, P.F., Chor, E.F., Ang, C.H., Ling, C.H., Joo, M.S., Yeo, I.S. |
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| Zdroj: | In Microelectronics Reliability August-October 2000 40(8-10):1609-1613 |
| Databáze: | ScienceDirect |
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