A new approach for eliminating unwanted patterns in attenuated phase shift masks
Autor: | Mukherjee-Roy, M. ∗, Singh, N., Mehta, S.S., Samudra, G.S. |
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Zdroj: | In Microelectronics Journal October 2003 34(10):965-967 |
Databáze: | ScienceDirect |
Externí odkaz: |