Steep retrograde indium channel profiling for high performance nMOSFETs device fabrication
| Autor: | Ong, S.Y. *, Chor, E.F., Leung, Y.K., Lee, James, Li, W.S., See, Alex, Chan, Lap |
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| Zdroj: | In Microelectronics Journal 2 January 2002 33(1-2):55-60 |
| Databáze: | ScienceDirect |
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