The removal of metal impurities from the surface of Czochralski wafers using a porous silicon-based gettering under a gas flow HCl/O2 dry
| Autor: | Zarroug, Ahmed, Hamed, Zied Ben, Laatar, Fakher, Derbali, Lotfi, Ezzaouia, Hatem |
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| Zdroj: | In Materials Research Bulletin July 2017 91:127-134 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect