Effect of annealing temperature on the microstructure and optical–electrical properties of Cu–Al–O thin films

Autor: Zhang, Y.J., Liu, Z.T., Zang, D.Y., Che, X.S., Feng, L.P., Bai, X.X.
Zdroj: In Journal of Physics and Chemistry of Solids December 2013 74(12):1672-1677
Databáze: ScienceDirect