Influence of the active layer thickness on the electrical properties of ZnO thin film transistors fabricated by radio frequency magnetron sputtering
| Autor: | Huang, Hai-Qin, Liu, Feng-Juan, Sun, Jian, Zhao, Jian-Wei, Hu, Zuo-Fu, Li, Zhen-Jun, Zhang, Xi-Qing |
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| Zdroj: | In Journal of Physics and Chemistry of Solids 2011 72(12):1393-1396 |
| Databáze: | ScienceDirect |
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