Thin film transistors based on TiO 2 fabricated by using radio-frequency magnetron sputtering
Autor: | Shih, W.S., Young, S.J., Ji, L.W., Water, W., Meen, T.H., Lam, K.T., Sheen, J., Chu, W.C. |
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Zdroj: | In Journal of Physics and Chemistry of Solids 2010 71(12):1760-1762 |
Databáze: | ScienceDirect |
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