Thin film transistors based on TiO 2 fabricated by using radio-frequency magnetron sputtering

Autor: Shih, W.S., Young, S.J., Ji, L.W., Water, W., Meen, T.H., Lam, K.T., Sheen, J., Chu, W.C.
Zdroj: In Journal of Physics and Chemistry of Solids 2010 71(12):1760-1762
Databáze: ScienceDirect