Comparative study of microcrystalline silicon films prepared in low or high pressure regime by hot-wire chemical vapor deposition
| Autor: | Niikura, C, Guillet, J, Brenot, R, Equer, B, Bourée, J.E *, Voz, C, Peiro, D, Asensi, J.M, Bertomeu, J, Andreu, J |
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| Zdroj: | In Journal of Non-Crystalline Solids 2000 266 Part 1:385-390 |
| Databáze: | ScienceDirect |
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