Infrared study of the structure of silicon oxynitride films produced by plasma enhanced chemical vapor deposition

Autor: Lisovskyy, I.P., Voitovych, M.V., Sarikov, A.V., Zlobin, S.O., Lukianov, A.N., Oberemok, O.S., Dubikovsky, O.V.
Zdroj: In Journal of Non-Crystalline Solids 1 October 2023 617
Databáze: ScienceDirect