Electron beam poling in amorphous Ge-doped H:SiO2 films

Autor: Liu, Q., Poumellec, B., Zhao, X., Girard, G., Bourée, J.-E., Kudlinski, A., Martinelli, G.
Zdroj: In Journal of Non-Crystalline Solids 15 January 2008 354(2-9):472-475
Databáze: ScienceDirect