Introduction of crystalline high- k gate dielectrics in a CMOS process
| Autor: | Gottlob, H.D.B., Lemme, M.C., Mollenhauer, T., Wahlbrink, T., Efavi, J.K., Kurz, H., Stefanov, Y., Haberle, K., Komaragiri, R., Ruland, T., Zaunert, F., Schwalke, U. |
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| Zdroj: | In Journal of Non-Crystalline Solids 2005 351(21):1885-1889 |
| Databáze: | ScienceDirect |
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