Low temperature–low hydrogen content silicon nitrides thin films deposited by PECVD using dichlorosilane and ammonia mixtures
Autor: | Santana, G., Fandiño, J., Ortiz, A., Alonso, J.C. |
---|---|
Zdroj: | In Journal of Non-Crystalline Solids 2005 351(10):922-928 |
Databáze: | ScienceDirect |
Externí odkaz: |