Low temperature–low hydrogen content silicon nitrides thin films deposited by PECVD using dichlorosilane and ammonia mixtures
| Autor: | Santana, G., Fandiño, J., Ortiz, A., Alonso, J.C. |
|---|---|
| Zdroj: | In Journal of Non-Crystalline Solids 2005 351(10):922-928 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect