Surface termination and hydrogen bubble adhesion on Si(1 0 0) surfaces during anisotropic dissolution in aqueous KOH
| Autor: | Haiss, Wolfgang, Raisch, Philipp, Bitsch, Lennart, Nichols, Richard J., Xia, Xinghua, Kelly, John J., Schiffrin, David J. |
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| Zdroj: | In Journal of Electroanalytical Chemistry 2006 597(1):1-12 |
| Databáze: | ScienceDirect |
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