Voltammetric and structural characterization of sputter deposited Al–Mg films

Autor: Grigucevičien≐, Asta, Leinartas, Konstantinas, Jušk≐nas, Remigijus, Juzeliūnas, Eimutis
Zdroj: In Journal of Electroanalytical Chemistry 2004 565(2):203-209
Databáze: ScienceDirect