Voltammetric and structural characterization of sputter deposited Al–Mg films
Autor: | Grigucevičien≐, Asta, Leinartas, Konstantinas, Jušk≐nas, Remigijus, Juzeliūnas, Eimutis |
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Zdroj: | In Journal of Electroanalytical Chemistry 2004 565(2):203-209 |
Databáze: | ScienceDirect |
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