Optimization of InP microchannel epitaxy on Si substrate achieved by addition of upper source
| Autor: | Naritsuka, Shigeya *, Nishinaga, Tatau, Tachikawa, Masami, Mori, Hidehumi |
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| Zdroj: | In Journal of Crystal Growth 2000 211(1):395-399 |
| Databáze: | ScienceDirect |
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