Optimization of InP microchannel epitaxy on Si substrate achieved by addition of upper source
Autor: | Naritsuka, Shigeya *, Nishinaga, Tatau, Tachikawa, Masami, Mori, Hidehumi |
---|---|
Zdroj: | In Journal of Crystal Growth 2000 211(1):395-399 |
Databáze: | ScienceDirect |
Externí odkaz: |