Low-temperature deposition of Si and SiO 2 thin-film layers in an ultrahigh vacuum system
| Autor: | Ohtsuka, K *, Yoshida, T, Oizumi, T, Murai, A, Kurabayashi, T, Nishizawa, J |
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| Zdroj: | In Journal of Crystal Growth 2000 209(2):331-334 |
| Databáze: | ScienceDirect |
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