In situ optical monitoring for SiGe epitaxy

Autor: Robbins, D.J *, Pickering, C, Russell, J, Carline, R.T, Dann, A.W, Marrs, A.D, Glasper, J.L
Zdroj: In Journal of Crystal Growth 2000 209(2):290-296
Databáze: ScienceDirect