Surface pretreatment and deposition temperature dependence of MgO epitaxy on GaN by thermal atomic layer deposition
| Autor: | Goodrich, Justin C., Farinha, Thomas G., Ju, Ling, Howzen, Alexandra J., Kundu, Animesh, Ogidi-Ekoko, Onoriode N., Wierer, Jonathan J., Jr., Tansu, Nelson, Strandwitz, Nicholas C. |
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| Zdroj: | In Journal of Crystal Growth 15 April 2020 536 |
| Databáze: | ScienceDirect |
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