Advantage of heteroepitaxial GaSb thin-film buffer and GaSb dot nucleation layer for GaSb/AlGaSb multiple quantum well structure grown on Si(1 0 0) substrate by molecular beam epitaxy

Autor: Machida, Ryuto, Akahane, Kouichi, Watanabe, Issei, Hara, Shinsuke, Fujikawa, Sachie, Kasamatsu, Akifumi, Fujishiro, Hiroki I.
Zdroj: In Journal of Crystal Growth 1 February 2019 507:357-361
Databáze: ScienceDirect