Variation in Si(1 0 0) surface roughness caused by H-termination during high-temperature Ar annealing
| Autor: | Araki, Koji, Isogai, Hiromichi, Takeda, Ryuji, Izunome, Koji, Zhao, Xinwei |
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| Zdroj: | In Journal of Crystal Growth 1 March 2011 318(1):84-88 |
| Databáze: | ScienceDirect |
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