Fabrication of 3-in GaN substrates by hydride vapor phase epitaxy using void-assisted separation method

Autor: Yoshida, Takehiro, Oshima, Yuichi, Eri, Takeshi, Ikeda, Ken, Yamamoto, Shunsuke, Watanabe, Kazutoshi, Shibata, Masatomo, Mishima, Tomoyoshi
Zdroj: In Journal of Crystal Growth 2008 310(1):5-7
Databáze: ScienceDirect