Ex situ dry cleaning of reactor component of nitride metal organic chemical vapor deposition using chlorinated gases
| Autor: | Fukuda, Yasushi, Orita, Takashi, Akutsu, Nakao, Ikenaga, Kazutada, Koseki, Syuuichi, Matsumoto, Koh, Hasaka, Satoshi |
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| Zdroj: | In Journal of Crystal Growth 2007 298:433-436 |
| Databáze: | ScienceDirect |
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