X-ray diffraction analysis of an osmium silicide epilayer grown on Si(1 0 0) by molecular beam epitaxy
| Autor: | Amir, F.Z., Cottier, R.J., Golding, T.D., Donner, W., Anibou, N., Stokes, D.W. |
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| Zdroj: | In Journal of Crystal Growth 2006 294(2):174-178 |
| Databáze: | ScienceDirect |
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