Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor
| Autor: | Cheng, T.S. ⁎, Hsiao, M.C. |
|---|---|
| Zdroj: | In Journal of Crystal Growth 2006 293(2):475-484 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Cheng, T.S. ⁎, Hsiao, M.C. |
|---|---|
| Zdroj: | In Journal of Crystal Growth 2006 293(2):475-484 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect