Crystal growth and oxygen precipitation behavior of 300 mm nitrogen-doped Czochralski silicon
| Autor: | Tian, Daxi, Yang, Deren, Ma, Xiangyang, Li, Liben, Que, Duanlin |
|---|---|
| Zdroj: | In Journal of Crystal Growth 2006 292(2):257-259 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect