The effects of AlN buffer on the properties of InN epitaxial films grown on Si(1 1 1) by plasma-assisted molecular-beam epitaxy

Autor: Wu, C.-L., Shen, C.-H., Chen, H.-Y., Tsai, S.-J., Lin, H.-W., Lee, H.-M., Gwo, S., Chuang, T.-F., Chang, H.-S., Hsu, T.M.
Zdroj: In Journal of Crystal Growth 2006 288(2):247-253
Databáze: ScienceDirect