Kinetics of SiGe chemical vapor deposition from chloride precursors
| Autor: | Lovtsus, A.A., Segal, A.S., Sid’ko, A.P., Talalaev, R.A., Storck, P., Kadinski, L. |
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| Zdroj: | In Journal of Crystal Growth 2006 287(2):446-449 |
| Databáze: | ScienceDirect |
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