Encapsulation of the heteroepitaxial growth of wide band gap γ-CuCl on silicon substrates

Autor: Lucas, F.O., O’Reilly, L., Natarajan, G., McNally, P.J., Daniels, S., Taylor, D.M., William, S., Cameron, D.C., Bradley, A.L., Miltra, A.
Zdroj: In Journal of Crystal Growth 2006 287(1):112-117
Databáze: ScienceDirect