Influence of sapphire annealing in trimethylgallium atmosphere on GaN epitaxy by MOCVD

Autor: Grzegorczyk, A.P., Hageman, P.R., Weyher, J.L., Larsen, P.K.
Zdroj: In Journal of Crystal Growth 15 September 2005 283(1-2):72-80
Databáze: ScienceDirect