Thin relaxed SiGe virtual substrates grown by low-energy plasma-enhanced chemical vapor deposition
| Autor: | Chrastina, D., Isella, G., Bollani, M., Rössner, B., Müller, E., Hackbarth, T., Wintersberger, E., Zhong, Z., Stangl, J., von Känel, H. |
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| Zdroj: | In Journal of Crystal Growth 2005 281(2):281-289 |
| Databáze: | ScienceDirect |
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